Two-phase optical inspection method and apparatus for defect detection
US5699447A · kind A · utility
177Cited by
13References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 12, 1991 |
| Grant date | Dec 16, 1997 |
| Priority date | — |
| Expiry date | Nov 12, 2011 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2021/887
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method and apparatus for inspecting the surface of articles, such as chips and wafers, for defects, includes a first phase of optically examining the complete surface of the article inspected by scanning its complete surface at a relatively high speed and with an optical beam of relatively small diameter, particularly a laser beam, and a second phase of optically examining with a relatively high spatial resolution only the suspected locations for the presence or absence of a defect therein.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.