Support post architecture for micromechanical devices
US5703728A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Nov 2, 1994 |
| Grant date | Dec 30, 1997 |
| Priority date | — |
| Expiry date | Nov 2, 2014 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S359/904
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A support pillar 426 for use with a micromechanical device, particularly a digital micromirror device, comprising a pillar material 422 supported by a substrate 400 and covered with a metal layer 406. The support pillar 426 is fabricated by depositing a layer of pillar material on a substrate 400, patterning the pillar layer to define a support pillar 426, and depositing a metal layer 406 over the support pillar 426 enclosing the support pillar. A planar surface even with the top of the pillar may be created by applying a spacer layer 432 over the pillars 426. After applying the spacer layer 432, the spacer layer 432 is etched to expose the tops of the pillars.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.