Method for the generation of stacking-fault-induced damage on the back of semiconductor wafers
US5710077A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jul 9, 1996 |
| Grant date | Jan 20, 1998 |
| Priority date | — |
| Expiry date | Jul 9, 2016 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/322
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
A method for the generation of stacking-fault-induced damage on the back of emiconductor wafers is by treating the back with loose hard-material particles which are suspended in a liquid. The back of the semiconductor wafer is brought into contact with the suspended hard-material particles and the hard-material particles are propelled tangentially to the back, under which circumstances they exert on the back of the semiconductor wafer forces which have essentially only tangentially directed components.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.