Photosensitive resin composition for forming light shielding films, black matrix formed by the same, and method for the production thereof
US5714286A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Dec 6, 1996 |
| Grant date | Feb 3, 1998 |
| Priority date | — |
| Expiry date | Dec 6, 2016 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2211/444
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A photosensitive resin composition for forming light shielding films is of particular utility in forming a black matrix for use in display elements such as of a CRT display, a liquid crystal panel, a plasma display and the like. The photosensitive resin composition is comprised of a photopolymerizable compound, a photopolymerization initiator, and light shielding materials composed of an oxide of copper and an oxide or oxides of at least one metal selected from iron, manganese, chromium, cobalt and nickel. The black matrix so obtained is conducive to high heat resistance, greatly light shielding and sharp image contrast as well as to excellent electrical insulation resistance. For use in the plasma display in particular, a black matrix is producible by coating of the photosensitive resin composition on a given substrate, followed by exposure of the coat to selective irradiation with active light rays to form a pattern therein and by subsequently burning of the pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.