Illumination aperture of low intensity loss
US5715040A · kind A · utility
9Cited by
23References
15Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Oct 12, 1995 |
| Grant date | Feb 3, 1998 |
| Priority date | — |
| Expiry date | Oct 12, 2015 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70058
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
In a photolithography system, an illumination assembly to provide intensified uniform illumination includes an illumination source reflector and a plate having an aperture opening therethrough and a mirrored surface thereon, the mirrored surface of the plate confronting the illumination source reflector. The illumination assembly further includes an illumination source for generating illumination disposed between the illumination source reflector and the plate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.