Reflection and refraction optical system and projection exposure apparatus using the same
US5715084A · kind A · utility
37Cited by
18References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 5, 1995 |
| Grant date | Feb 3, 1998 |
| Priority date | — |
| Expiry date | Jun 5, 2015 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S359/90
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A reflection and refraction optical system includes a polarization beam splitter, a concave mirror, a lens group and a quarter waveplate, wherein an additional waveplate is provided to transform S-polarized light from the polarization beam splitter into circularly polarized light.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.