Sulfonic acid esters, radiation-sensitive mixtures prepared therewith and their use

US5716756A · kind A · utility

Assignees

• Hoechst GmbH · DE
• Herberts Gesellschaft mit beschrankter Haftung · DE

Inventors

• Georg Pawlowski · Saitama, JP
• Walter Spiess · Dieburg, DE
• Horst Roeschert · Ober-Hilbersheim, DE
• Wolfgang Appel · Kelkheim, DE
• Walter Herr · Eppstein, DE

Key dates

• Filing date: May 30, 1995
• Grant date: Feb 10, 1998
• Expiry date: May 30, 2015

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/0045
• WIPO field: Organic fine chemistry
• WIPO sector: Chemistry

Abstract

Sulfonic acid esters are used as (a) compounds for forming a strong acid on irradiation in radiation-sensitive, positive or negative working mixtures also comprising (b) either a compound with at least one acid-decomposable C--O--C or C--O--Si bond (for positive working mixtures) or a compound with at least acid-cross-linkable groups (for negative working mixtures) and c) a binder which is insoluble in water but soluble or at least swellable in aqueous alkaline solutions, wherein said sulfonic acid esters are formula EQU R.sup.1 --CR.sup.2 (CF.sub.3)--O--SO.sub.2 --!.sub.n R.sup.3(I) or EQU R.sup.1 --CR.sup.2 (CF.sub.3)--O--SO.sub.2 --R.sup.3 !m (II) wherein R.sup.1, R.sup.2, R.sup.3, n and n are defined with the body of the disclosure. These mixtures are particularly suitable for exposure to deep UV radiation in the formation of recording materials suitable for the production of photoresists, electronic components, and printing plates.