Drip chemical delivery method and apparatus
US5723019A · kind A · utility
24Cited by
11References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 18, 1996 |
| Grant date | Mar 3, 1998 |
| Priority date | — |
| Expiry date | Mar 18, 2016 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S134/902
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A drip chemical delivery system used in semiconductor substrate cleaning processes. A drip chemical delivery system which uses small openings in a pipe (holes) and a low air pressure to saturate the brushes in a double sided brush system. This drip delivery system reduces the volumes of chemical solutions used in a scrubbing process and helps to maintain control of the pH profile of a substrate. This system is described and illustrated in the manner it is used in conjunction with a double sided scrubber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.