Frame-supported pellicle for photomask protection
US5723860A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jun 28, 1996 |
| Grant date | Mar 3, 1998 |
| Priority date | — |
| Expiry date | Jun 28, 2016 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/249985
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Proposed is an improvement in a frame-supported pellicle, which is a device for dust-proof protection of a photomask used in the photolithographic patterning works in the manufacture of fine electronic devices, consisting of a rigid pellicle frame, a highly transparent membrane of a plastic resin spread over and adhesively bonded to one end surface of the pellicle frame in a slack-free fashion and a layer of a pressure-sensitive adhesive formed on the other end surface of the pellicle frame to facilitate mounting of the frame-supported pellicle on the surface of a photomask and to secure the same at the correct position. The improvement comprises forming the layer of the pressure-sensitive adhesive on the end surface of the pellicle frame to have an outwardly convex surface, for example, in the form of a barrel vault instead of the flat surface in the prior art so that the troubles in the prior art due to occurrence of air gaps between the surface of the adhesive layer and the surface of the photomask unavoidable in mounting of the conventional frame-supported pellicle can be prevented to ensure completely air-tight sealing thereby. The adverse influence on the pellicle membrane du…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.