Patent · US Expired

Method for measuring the electrical potential in a semiconductor element

US5723981A · kind A · utility

39Cited by
17References
21Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 25, 1996
Grant dateMar 3, 1998
Priority date
Expiry dateJun 25, 2016

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S977/854
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

Measuring an electrical potential in a semiconductor element by applying one or more voltages over the semiconductor element, placing one or more conductors in contact with the semi-conductor element using a scanning proximity microscope, calibrating the contact force between the conductors and the semiconductor element and measuring an electrical potential in the semi-conductor element with at least one of the conductors while injecting a substantially zero current in the semiconductor element. To measure the electrical potential distribution within the semiconductor, the position of at least one of the conductors is changed and the electric potential re-measured.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.