Apparatus for and method of polishing and planarizing polycrystalline diamonds, and polished and planarized polycrystalline diamonds and products made therefrom
US5725413A · kind A · utility
14Cited by
19References
29Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 6, 1994 |
| Grant date | Mar 10, 1998 |
| Priority date | — |
| Expiry date | May 6, 2014 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB24B37/04
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
Disclosed are polished and planarized diamond films and a method and apparatus for polishing and planarizing diamond films. The method generally includes mechanical polishing of the diamond film against a ceramic surface in the presence of a treating agent of potassium nitrate and a polishing agent of potassium hydroxide. The produced films have an average surface roughness on the order of 0.05 microns, a planarization uniformity within eight percent, and are relatively free of process-induced contaminants.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.