Apparatus for coating substrates by cathode sputtering with a hollow target
US5728280A · kind A · utility
11Cited by
9References
5Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Feb 19, 1997 |
| Grant date | Mar 17, 1998 |
| Priority date | — |
| Expiry date | Feb 19, 2017 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3405
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A pot-shaped hollow target (4) is open toward the substrate (3) that is to be coated, a dark-space shield (6) surrounds the lateral wall (5) of the target (4), and a cathode base body (11) is supported on an insulator (8) on the roof (9) of the vacuum chamber (2) and is connected electrically to a power source (10). A magnet belt (12) formed of a plurality of magnets (18, 18') surrounds the dark-space shield (6). A turntable (15) having an axis of rotation (16) parallel to and offset from the target's (4) perpendicular plane of symmetry (17) is provided for holding the substrates (3).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.