Photoresist composition for use in color filters
US5731110A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 29, 1996 |
| Grant date | Mar 24, 1998 |
| Priority date | — |
| Expiry date | Aug 29, 2016 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B5/223
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
An azo dye for use in color filters soluble in alkaline aqueous solutions and organic solvents and having in one molecule at least one sulfonamido group of which one hydrogen atom is substituted; and a method for producing a color filter having a plurality of color filter elements which comprises the steps of a) coating a substrate with an organic solvent solution of a photoresist composition containing said azo dye and drying the coat to form an adhering layer, b) exposing a specific part of said layer to radiation ray, c) developing the exposed or unexposed region with alkali to form a colored pattern, and d) repeating the steps a)-c) on every dye of different color present in said composition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.