Naoki Takeyama
21Patents
7h-index
28Co-inventors
65Inventor score
Filing activity: Apr 30, 1991 → Sep 17, 2003
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6656660B1 | Resist composition | Emerging Cross-Sectional Technologies | 26 | Expired |
| US5585218A | Photoresist composition containing alkyletherified polyvinylphenol | Emerging Cross-Sectional Technologies | 22 | Expired |
| US5876895A | Photosensitive resin composition for color filter | Physics | 20 | Expired |
| US5304456A | Negative photoresist composition | Emerging Cross-Sectional Technologies | 15 | Expired |
| US5478680A | Color filter | Emerging Cross-Sectional Technologies | 10 | Expired |
| US5731110A | Photoresist composition for use in color filters | Physics | 10 | Expired |
| US5397679A | Cyclic carbonate compounds, method for producing the same and positive photoresist composition using the same | Emerging Cross-Sectional Technologies | 7 | Expired |
| US6329119A | Negative type resist composition | Emerging Cross-Sectional Technologies | 6 | Expired |
| US5198323A | Resist composition containing alkali-soluble resin, 1,2-quinone diazide compound and anti-halation component | Emerging Cross-Sectional Technologies | 6 | Expired |
| US5686585A | Azo dyes for use in color filters and method for production of color filters | Physics | 6 | Expired |
| US5362598A | Quinone diazide photoresist composition containing alkali-soluble resin and an ultraviolet ray absorbing dye | Physics | 6 | Expired |
| US5985511A | Photoresist composition | Emerging Cross-Sectional Technologies | 5 | Expired |
| US5614594A | Curable resin composition for overcoat film of color filter and color filter | Physics | 4 | Expired |
| US5420331A | Cyclic carbonate compounds, method for producing the same and positive photoresist composition using the same | Emerging Cross-Sectional Technologies | 4 | Expired |
| US5846688A | Photoresist composition | Emerging Cross-Sectional Technologies | 4 | Expired |
| US5395727A | Positive resist composition containing a novolak resin made from an aldehyde and dimer of isopropenyl phenol | Physics | 3 | Expired |
| US5965748A | Succinimide derivative, process for production and use thereof | Emerging Cross-Sectional Technologies | 2 | Expired |
| US6280902A | Positive working photoresist compositions comprising a nitrogen-containing cyclic compound | Emerging Cross-Sectional Technologies | 2 | Expired |
| US6156476A | Positive photoresist composition | Emerging Cross-Sectional Technologies | 2 | Expired |
| US5800966A | Positive photoresist composition | Physics | 1 | Expired |
| USRE40964E1 | Negative type resist composition | General | 0 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.