Hot stage for scanning probe microscope
US5731587A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Aug 12, 1996 |
| Grant date | Mar 24, 1998 |
| Priority date | — |
| Expiry date | Aug 12, 2016 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S977/871
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A hot stage for a scanning probe microscope includes a substrate having a dielectric window region which is stress compensated to be held in mild tension at elevated temperatures. A heating element is supplied to heat a specimen deposited on the dielectric widow region and the scanning probe microscope is used to observe specimen characteristics at the elevated temperatures. The dielectric window region is configured to be thermally isolated from the rest of the hot stage allowing only a minimum amount of heat to be dissipated into the scanning probe microscope. Temperature sensing resistors are included for monitoring the temperature in the dielectric window region. Conductivity cell electrodes can also be included for sensing the conductivity and capacitance of the specimen. Furthermore, additional control and measurement hardware, such as a temperature sensor circuit, evaluation station, the ramp generator circuit, etc. can be included to provide additional system features.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.