Fluorescent X-ray analyzing apparatus
US5732120A · kind A · utility
Assignees
Inventors
Key dates
| Filing date | May 19, 1997 |
| Grant date | Mar 24, 1998 |
| Priority date | — |
| Expiry date | May 19, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2223/076
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A fluorescent X-ray analyzing apparatus includes a source of excitation (2) for irradiating a silicon-based sample (S) with primary X-rays (B2) to excite the silicon-based sample (S), a detector (4) for detecting fluorescent X-rays (B5) emitted from the silicon-based sample (S), and an analyzer (6) for analyzing elements contained in the silicon-based sample (S) based on a result of detection performed by the detector (4). The primary X-rays (B2) emitted from the source of excitation (2) have a wavelength higher than, but in the vicinity of a wavelength at an Si--K absorption edge so that generation of fluorescent X-rays (B5) of Si is suppressed to minimize a noise which would occur during detection of fluorescent X-rays (B5) of Na and Al to thereby accomplish an accurate analysis of a minute quantity of NA and Al contained in the sample (S).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.