Antireflective coating for photoresist compositions
US5733714A · kind A · utility
40Cited by
15References
28Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 30, 1996 |
| Grant date | Mar 31, 1998 |
| Priority date | — |
| Expiry date | Sep 30, 2016 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/151
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention relates to a novel antireflective coating solution and a process for its use in photolithography. The antireflective coating solution comprises a novel polymer and an organic solvent or a mixture of organic solvents, where the novel polymer comprises a unit containing a dye that absorbs from about 180 nm to about 450 nm and a unit containing a crosslinking group.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.