Bias-tracking D.C. power circuit for an electrostatic chuck
US5737175A · kind A · utility
51Cited by
11References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 19, 1996 |
| Grant date | Apr 7, 1998 |
| Priority date | — |
| Expiry date | Jun 19, 2016 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH02N13/00
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A DC power circuit for a electrostatic chuck adapted for use in a plasma etching system is disclosed. The power circuit receives an input that reflects a voltage bias on the workpiece caused by the application of an RF signal for creating the plasma. A DC power supply outputs a differential voltage that is balanced by inputting the voltage bias to a common reference node. The balanced DC output voltages are then presented to two electrodes of the ESC to create a clamping force securing the workpiece to the chuck at a lower voltage than would otherwise be applied in the absence of the bias feedback.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.