Substrate handling and processing system for flat panel displays
US5738767A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Nov 23, 1994 |
| Grant date | Apr 14, 1998 |
| Priority date | — |
| Expiry date | Nov 23, 2014 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/566
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A vacuum processing system for handling and processing rectangular glass panels for flat panel displays has a cluster configuration. The system includes a central buffer chamber, with multiple processing chambers, a load lock and an unload lock positioned around the buffer chamber and coupled to the buffer chamber through gate valves. The buffer chamber contains a turntable that is rotatable about a vertical axis. The system further includes substrate carriers, each for supporting a substrate in a vertical orientation as it is transported through the system and is processed. The turntable has dual substrate carrier positions for rotating substrate carriers into alignment with a selected processing chamber, the load lock or the unload lock. Multiple substrates can be handled and processed concurrently to achieve a high throughput rate. The system is typically used for sputter deposition of ITO films and metal films on the glass substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.