Positive photoresist composition
US5738968A · kind A · utility
5Cited by
10References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 25, 1997 |
| Grant date | Apr 14, 1998 |
| Priority date | — |
| Expiry date | Mar 25, 2017 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0226
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention provides a positive photoresist composition exhibiting superior sensitivity, definition and thermostability, and in addition, having excellent focal depth range properties. The positive photoresist composition comprises (A) an alkali-soluble resin; (B) a quinonediazide group-containing compound; and (C), for example, bis(4-hydroxy-2,3,5-trimethylphenyl)-2-hydroxyphenylmethane.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.