Kousuke Doi
33Patents
8h-index
36Co-inventors
71Inventor score
Filing activity: Oct 8, 1993 → May 19, 2004
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5501936A | Positive-working quinonediazide photoresist composition containing a cyclohexyl-substituted triphenylmethane compound | Physics | 15 | Expired |
| US6120969A | Polyphenol compound, quinonediazide ester and positive photoresist composition | Physics | 13 | Expired |
| US6517993B2 | Copolymer, photoresist composition, and process for forming resist pattern with high aspect ratio | Emerging Cross-Sectional Technologies | 12 | Expired |
| US5478692A | Positive-working naphthoquinone diazide sulfonic acid ester photoresist composition containing 4,4'-bis(dialkylamino)benzophenone | Physics | 11 | Expired |
| US5853948A | Positive photoresist compositions and multilayer resist materials using the same | Physics | 11 | Expired |
| US5601961A | High-sensitivity positive-working photoresist composition | Physics | 11 | Expired |
| US5434031A | Positive-working naphthoquinone diazide photoresist composition containing specific hydroxy compound additive | Physics | 10 | Expired |
| US6379859B2 | Positive photoresist composition and process for forming resist pattern using same | Physics | 8 | Expired |
| US7358028B2 | Chemically amplified positive photo resist composition and method for forming resist pattern | Emerging Cross-Sectional Technologies | 6 | Expired |
| US6177226A | Positive photoresist composition and process for forming contact hole | Physics | 5 | Expired |
| US6296992A | Positive photoresist composition and process for forming contact hole | Physics | 5 | Expired |
| US5738968A | Positive photoresist composition | Physics | 5 | Expired |
| US5401605A | Positive working photosensitive resin composition containing 1,2-naphthoquinone diazide esterification product of triphenylmethane compound | Physics | 5 | Expired |
| US5384228A | Alkali-developable positive-working photosensitive resin composition | Chemistry; Metallurgy | 4 | Expired |
| US7060410B2 | Novolak resin solution, positive photoresist composition and preparation method thereof | Physics | 4 | Expired |
| US6312863A | Positive photoresist composition | Physics | 4 | Expired |
| US6187500A | Positive photoresist compositions and multilayer resist materials using same | Chemistry; Metallurgy | 4 | Expired |
| US6300033A | Positive photoresist composition and process for forming resist pattern | Physics | 4 | Expired |
| US6127087A | Positive photoresist compositions and multilayer resist materials using same | Physics | 4 | Expired |
| US6406827B2 | Positive photoresist composition and process for forming resist pattern | Physics | 3 | Expired |
| US5702861A | Positive photoresist composition | Physics | 3 | Expired |
| US6030741A | Positive resist composition | Physics | 3 | Expired |
| US6207340A | Positive photoresist composition and process for forming contact hole | Physics | 3 | Expired |
| US6207788A | Novolak resin precursor, novolak resin and positive photoresist composition containing the novolak resin | Physics | 2 | Expired |
| US6869742B2 | Positive photoresist composition | Physics | 2 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.