Method of inspecting a pattern formed on a sample for a defect, and an apparatus thereof
US5744381A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 12, 1996 |
| Grant date | Apr 28, 1998 |
| Priority date | — |
| Expiry date | Mar 12, 2016 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L22/12
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A pattern defect inspection apparatus comprises a light irradiating portion, a light receive element, a light receive element amplifier, a preparation portion for preparing multi-valued design pattern image data, an offset adjusting portion, a gain adjusting portion, and an inspecting portion. The offset adjusting portion adjusts the offset of the light receive element amplifier such that measurement data of a translucent portion of a pattern on a sample surface corresponds to design pattern image data corresponding to the translucent portion, regarding the translucent portion as a non-transparent portion. The gain adjusting portion adjusts the gain of the light receive element amplifier such that measurement data of a transparent portion of the pattern on the sample surface corresponds to design pattern image data corresponding to the transparent portion.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.