Localized simulated annealing
US5745735A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Oct 26, 1995 |
| Grant date | Apr 28, 1998 |
| Priority date | — |
| Expiry date | Oct 26, 2015 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F2111/06
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
According to the present invention, a method of optimization by simulated annealing is provided that uses a spatial metric to localize the simulated annealing temperature, the move set, and the objects which the moves operate on. The method keeps a local history of the optimization process. The localization allows the simulated annealing process to adaptively control the annealing schedule of each local region independently. This allows the annealing temperature, move set, and the objects upon which the move set operates to each be adjusted for each region independently to maximize efficiency. This results in optimization of all regions in a quick and efficient manner.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.