Method for plasma downstream processing
US5750208A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Jul 17, 1996 |
| Grant date | May 12, 1998 |
| Priority date | — |
| Expiry date | Jul 17, 2016 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32357
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method for performing plasma downstream processing by generating plasma of an oxygen-containing gas with a microwave in a space having a thickness of 1/10, or less, of a wavelength .lambda. of the microwave, deriving the generated plasma of the oxygen containing gas from such space through an opening formed around the central portion of such plasma generating space through a gap having a loop-shaped cross section in a plane parallel to the space and folded cross section in a plane including a central portion normal to such space; and irradiating the generated plasma of the oxygen containing gas derived from the plasma generating space to an object to be processed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.