Satoru Mihara
17Patents
8h-index
35Co-inventors
72Inventor score
Filing activity: Jan 8, 1990 → Jun 24, 2020
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6287986A | Sputtering film forming method, sputtering film forming equipment, and semiconductor device manufacturing method | Electricity | 60 | Expired |
| US5447598A | Process for forming resist mask pattern | Electricity | 38 | Expired |
| US5681780A | Manufacture of semiconductor device with ashing and etching | Electricity | 34 | Expired |
| US4987284A | Downstream microwave plasma processing apparatus having an improved coupling structure between microwave plasma | Electricity | 32 | Expired |
| US6509593B2 | Semiconductor device and method of manufacturing the same | Electricity | 27 | Expired |
| US5560803A | Plasma ashing method with oxygen pretreatment | Physics | 12 | Expired |
| US6020111A | Method of manufacturing semiconductor device with patterned lamination of Si film and metal film | Electricity | 10 | Expired |
| US6674633B2 | Process for producing a strontium ruthenium oxide protective layer on a top electrode | Electricity | 9 | Expired |
| US5030316A | Trench etching process | Electricity | 5 | Expired |
| US6044850A | Semiconductor device manufacturing method including ashing process | Electricity | 5 | Expired |
| US6071828A | Semiconductor device manufacturing method including plasma etching step | Electricity | 4 | Expired |
| US6913970B2 | Semiconductor device and method of manufacturing the same | Electricity | 4 | Expired |
| US5562775A | Plasma downstream processing | Electricity | 3 | Expired |
| US5750208A | Method for plasma downstream processing | Electricity | 2 | Expired |
| US12381297B2 | Cylindrical non-aqueous electrolyte secondary cell | Emerging Cross-Sectional Technologies | 0 | Active |
| US8482097B2 | Semiconductor device | Electricity | 0 | Active |
| US8283235B2 | Method of manufacturing semiconductor device | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.