Isolation of novolak resin by low temperature sub surface forced steam distillation
US5750632A · kind A · utility
6Cited by
2References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 30, 1994 |
| Grant date | May 12, 1998 |
| Priority date | — |
| Expiry date | Dec 30, 2014 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0236
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
A water insoluble, aqueous alkali soluble novolak resin, process for producing such a novolak resin, a photoresist containing such a novolak resin, and a method for producing a semiconductor device, wherein the resin is isolated by sub surface forced steam distillation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.