N-vinyllactam derivatives and polymer thereof
US5750680A · kind A · utility
24Cited by
2References
2Claims
0Family size
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Key dates
| Filing date | Sep 12, 1996 |
| Grant date | May 12, 1998 |
| Priority date | — |
| Expiry date | Sep 12, 2016 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/039
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
N-vinyllactam derivatives protected at the 3-position are provided and represented by the following formula (I). These are polymerized into homo- and copolymers for use in microlithography of semiconductor manufacture. The polymers are used as a photoresist material suitable for a deep UV process so that pictures of high sensitivity and high resolution can be obtained. In addition, ultrafine circuits can be formed and an exceptional improvement in pattern formation can be accomplished through the use of the photoresist of the invention. ##STR1##
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.