Min Ho Jung
102Patents
13h-index
70Co-inventors
89Inventor score
Filing activity: Sep 12, 1996 → Dec 28, 2020
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6225020A | Polymer and a forming method of a micro pattern using the same | Physics | 471 | Expired |
| US6316162A | Polymer and a forming method of a micro pattern using the same | Emerging Cross-Sectional Technologies | 460 | Expired |
| US6589707B2 | Partially crosslinked polymer for bilayer photoresist | Emerging Cross-Sectional Technologies | 457 | Expired |
| US6811960B2 | Partially crosslinked polymer for bilayer photoresist | Emerging Cross-Sectional Technologies | 449 | Expired |
| US6150069A | Oxabicyclo compound, a polymer-containing said compound, and a photoresist micro pattern forming method using the same | Physics | 27 | Expired |
| US5750680A | N-vinyllactam derivatives and polymer thereof | Physics | 24 | Expired |
| US6235447A | Photoresist monomers, polymers thereof, and photoresist compositions containing the same | Physics | 20 | Expired |
| US6051678A | Copolymers containing N-vinyllactam derivatives, preparation methods thereof and photoresists therefrom | Physics | 19 | Expired |
| US6309790A | Organic anti-reflective coating material and its preparation | Emerging Cross-Sectional Technologies | 17 | Expired |
| US6235448A | Photoresist monomers, polymers thereof, and photoresist compositions containing the same | Physics | 15 | Expired |
| US6368768B1 | Organic anti-reflective coating material and its preparation | Chemistry; Metallurgy | 15 | Expired |
| US6388039B1 | Organic anti-reflective polymer and method for manufacturing thereof | Chemistry; Metallurgy | 15 | Expired |
| US6632903B2 | Polymer-containing photoresist, and process for manufacturing the same | Chemistry; Metallurgy | 14 | Expired |
| US6312865A | Semiconductor device using polymer-containing photoresist, and process for manufacturing the same | Chemistry; Metallurgy | 13 | Expired |
| US6489432B2 | Organic anti-reflective coating polymer and preparation thereof | Chemistry; Metallurgy | 12 | Expired |
| US6426171B1 | Photoresist monomer, polymer thereof and photoresist composition containing it | Physics | 12 | Expired |
| US6265130A | Photoresist polymers of carboxyl-containing alicyclic compounds | Emerging Cross-Sectional Technologies | 12 | Expired |
| US6395397B2 | Organic anti-reflective coating polymer and preparation thereof | Emerging Cross-Sectional Technologies | 12 | Expired |
| US6492441B2 | Anti reflective coating polymers and the preparation method thereof | Physics | 12 | Expired |
| US6692891B2 | Photoresist composition containing photo radical generator with photoacid generator | Emerging Cross-Sectional Technologies | 11 | Expired |
| US6803172B2 | Organic anti-reflective coating material and preparation thereof | Emerging Cross-Sectional Technologies | 11 | Expired |
| US6369181B1 | Copolymer resin, preparation thereof, and photoresist using the same | Emerging Cross-Sectional Technologies | 10 | Expired |
| US6391518B1 | Polymers and photoresist compositions using the same | Physics | 10 | Expired |
| US6350818B1 | Anti reflective coating polymers and the preparation method thereof | Physics | 10 | Expired |
| US6291131A | Monomers for photoresist, polymers thereof, and photoresist compositions using the same | Emerging Cross-Sectional Technologies | 10 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.