Undercoating composition for photolithography
US5756255A · kind A · utility
21Cited by
7References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Nov 12, 1996 |
| Grant date | May 26, 1998 |
| Priority date | — |
| Expiry date | Nov 12, 2016 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/124
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Proposed is a novel undercoating composition used in the photolithographic patterning of a photoresist layer by intervening between the substrate surface and the photoresist layer to decrease the adverse influences of the reflecting light from the substrate surface. The undercoating composition of the invention comprises (a) a melamine compound substituted by methylol groups and/or alkoxymethyl groups and (b) a polyhydroxy benzophenone compound, diphenyl sulfone compound or diphenyl sulfoxide compound, optionally, with admixture of (c) an alkali-insoluble resin of a (meth)acrylic acid ester.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.