Etsuko Iguchi
23Patents
10h-index
19Co-inventors
64Inventor score
Filing activity: Apr 1, 1996 → Apr 29, 2002
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5736296A | Positive resist composition comprising a mixture of two polyhydroxystyrenes having different acid cleavable groups and an acid generating compound | Emerging Cross-Sectional Technologies | 35 | Expired |
| US6268108A | Composition for forming antireflective coating film and method for forming resist pattern using same | Physics | 23 | Expired |
| US6071673A | Method for the formation of resist pattern | Emerging Cross-Sectional Technologies | 22 | Expired |
| US5939510A | Undercoating composition for photolithographic resist | Physics | 22 | Expired |
| US5756255A | Undercoating composition for photolithography | Emerging Cross-Sectional Technologies | 21 | Expired |
| US6284428A | Undercoating composition for photolithographic resist | Emerging Cross-Sectional Technologies | 20 | Expired |
| US6319815A | Electric wiring forming method with use of embedding material | Electricity | 19 | Expired |
| US5948847A | Undercoating composition for photolithographic patterning | Physics | 12 | Expired |
| US6087068A | Undercoating composition for photolithographic resist | Physics | 11 | Expired |
| US6544717B2 | Undercoating composition for photolithographic resist | Emerging Cross-Sectional Technologies | 11 | Expired |
| US5700625A | Negative-working photoresist composition | Physics | 10 | Expired |
| US5925495A | Photoresist laminate and method for patterning using the same | Emerging Cross-Sectional Technologies | 9 | Expired |
| US6042988A | Chemical-amplification-type negative resist composition | Emerging Cross-Sectional Technologies | 8 | Expired |
| US6693049B2 | Method for filling fine hole | Physics | 8 | Expired |
| US5789136A | Negative-working photoresist composition | Emerging Cross-Sectional Technologies | 7 | Expired |
| US5908738A | Undercoating composition for photolithography | Emerging Cross-Sectional Technologies | 7 | Expired |
| US6159652A | Positive resist composition | Emerging Cross-Sectional Technologies | 5 | Expired |
| US6297174A | Method for the formation of a planarizing coating film on substrate surface | Electricity | 5 | Expired |
| US6689535B2 | Anti-reflective coating composition, multilayer photoresist material using the same, and method for forming pattern | Physics | 4 | Expired |
| US6083665A | Photoresist laminate and method for patterning using the same | Emerging Cross-Sectional Technologies | 3 | Expired |
| US5854357A | Process for the production of polyhydroxstyrene | Emerging Cross-Sectional Technologies | 2 | Expired |
| US6734258B2 | Protective coating composition for dual damascene process | Chemistry; Metallurgy | 2 | Expired |
| US6599682B2 | Method for forming a finely patterned photoresist layer | Emerging Cross-Sectional Technologies | 1 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.