Gas analysis or leak detection process and device for same
US5756881A · kind A · utility
7Cited by
12References
16Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 20, 1995 |
| Grant date | May 26, 1998 |
| Priority date | — |
| Expiry date | Dec 20, 2015 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01M3/205
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A process and device for gas analysis has an input for a gas analyzer which is meant for connection to a vacuum pump. At least a portion of the gas to be analyzed is supplied at the inlet by applying a pump flux to the inlet. Superimposed on the pump flux is a further gas flux which is supplied over one or more gas line segments at a non-molecular flow-dominant flowrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.