Sensor and method for manufacturing a sensor
US5756901A · kind A · utility
53Cited by
11References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 24, 1996 |
| Grant date | May 26, 1998 |
| Priority date | — |
| Expiry date | Sep 24, 2016 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01P2015/0814
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
In a sensor and a method for manufacturing a sensor, a movable element is patterned out of a silicon layer and is secured to a substrate. The conducting layer is subdivided into various regions, which are electrically insulated from one another. The electrical connection between the various regions of the silicon layer is established by a conducting layer, which is arranged between a first and a second insulating layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.