Patent · US Expired

Sensor and method for manufacturing a sensor

US5756901A · kind A · utility

53Cited by
11References
8Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 24, 1996
Grant dateMay 26, 1998
Priority date
Expiry dateSep 24, 2016

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01P2015/0814
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

In a sensor and a method for manufacturing a sensor, a movable element is patterned out of a silicon layer and is secured to a substrate. The conducting layer is subdivided into various regions, which are electrically insulated from one another. The electrical connection between the various regions of the silicon layer is established by a conducting layer, which is arranged between a first and a second insulating layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.