High resolution i-line photoresist of high sensitivity

US5759740A · kind A · utility

Assignee

• Ciba Specialty Chemicals Corporation · US

Inventors

• Norbert Munzel · Heitersheim, DE
• Reinhard Schulz · Hannover, DE
• Heinz Holzwarth · Bad Krozingen, DE
• Stephan Ilg · Giebenach, CH

Key dates

• Filing date: Nov 13, 1996
• Grant date: Jun 2, 1998
• Expiry date: Nov 13, 2016

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S430/123
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

The invention relates to the use of oxime sulfonates of formula 1 ##STR1## wherein R is naphthyl, ##STR2## Ar is an unsubstituted aryl group or an aryl group which carries one or more than one substituent selected from the group consisting of nitro, chloro, bromo, hydroxyl, C.sub.1 -C.sub.4 alkyl, C.sub.1 -C.sub.4 perfluoroalkyl, C.sub.1 -C.sub.4 alkoxy and acid degradable substituent; PA1 R.sub.0 is either a R.sub.1 -X group or R.sub.2 ; PA1 X is an oxygen or a sulfur atom; PA1 R.sub.1 is hydrogen, C.sub.1 -C.sub.4 alkyl or unsubstituted phenyl or phenyl which is substituted by a member selected from the group consisting of chloro, bromo, C.sub.1 -C.sub.4 alkyl and C.sub.1 -C.sub.4 alkoxy, and PA1 R.sub.2 is hydrogen, C.sub.1 -C.sub.4 alkyl or an acid-degradable substituent, as radiation-sensitive photoacid generator in a chemically amplified photoresist which is developable in alkaline medium and is sensitive to radiation of a wavelength in the range from 340-390 nm, and to corresponding positive-working and negative-working photoresists for the cited wavelength range.