Dual guide beam stage mechanism with yaw control
US5760564A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Jun 27, 1995 |
| Grant date | Jun 2, 1998 |
| Priority date | — |
| Expiry date | Jun 27, 2015 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB23Q3/00
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
A dual guide beam stage mechanism for accurate X-Y positioning for use e.g. in semiconductor processing equipment provides accurate planar motion and yaw control. Over-constraint between components in their relative motion is minimized by utilizing flexibly mounted air bearings at the connection between at least one of the moveable guide beams and its corresponding stationary guide, and between at least one of the guide beams and the adjacent stage itself. Thus stage yaw motion is provided by allowing yaw motion of one of the guide beams. Preloading provides enough constraint through the air bearings without over-constraining the moving components, thereby improving accuracy and also reducing the need for close manufacturing tolerances.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.