NIKON PRECISION INC.
42Patents
10Active
42Granted
41Portfolio score
Filing activity: Feb 20, 1990 → Aug 30, 2017 · 4 expiring within 5 years
Most-cited patents
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US5825043A | Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus | Physics | 1,043 | Expired |
| US6191429A | Projection exposure apparatus and method with workpiece area detection | Physics | 611 | Expired |
| US5623853A | Precision motion stage with single guide beam and follower stage | Emerging Cross-Sectional Technologies | 464 | Expired |
| US5528118A | Guideless stage with isolated reaction stage | Emerging Cross-Sectional Technologies | 460 | Expired |
| US5515207A | Multiple mirror catadioptric optical system | Physics | 76 | Expired |
| US6842223B2 | Enhanced illuminator for use in photolithographic systems | Physics | 74 | Expired |
| US5323263A | Off-axis catadioptric projection system | Physics | 70 | Expired |
| US5760564A | Dual guide beam stage mechanism with yaw control | Performing Operations; Transporting | 67 | Expired |
| US5453814A | Illumination source and method for microlithography | Physics | 63 | Expired |
| US5437946A | Multiple reticle stitching for scanning exposure system | Physics | 42 | Expired |
| US6750952B2 | Apparatus for preforming measurement of a dimension of a test mark for semiconductor processing | Physics | 42 | Expired |
| US5631731A | Method and apparatus for aerial image analyzer | Physics | 41 | Expired |
| US5552888A | Apparatus for measuring position of an X-Y stage | Physics | 36 | Expired |
| US5835227A | Method and apparatus for determining performance characteristics in lithographic tools | Physics | 27 | Expired |
| US5866935A | Tunneling device | Physics | 23 | Expired |
| US6664121B2 | Method and apparatus for position measurement of a pattern formed by a lithographic exposure tool | Physics | 23 | Expired |
| US4991160A | Integrated optical device for magneto-optical recording and reading head | Physics | 20 | Expired |
| US6094256A | Method for forming a critical dimension test structure and its use | Physics | 19 | Expired |
| US5838450A | Direct reticle to wafer alignment using fluorescence for integrated circuit lithography | Physics | 16 | Expired |
| US6974653B2 | Methods for critical dimension and focus mapping using critical dimension test marks | Physics | 15 | Expired |
| US5729343A | Film thickness measurement apparatus with tilting stage and method of operation | Physics | 15 | Expired |
| US5602619A | Scanner for step and scan lithography system | Physics | 13 | Expired |
| US6449031B1 | Method for use of a critical dimensional test structure | Physics | 10 | Expired |
| US8365107B2 | Scanner based optical proximity correction system and method of use | Physics | 9 | Active |
| US6436589B1 | Reticle having an interleave kerf | Physics | 9 | Expired |
Source: USPTO / EPO open patent data. Counts and citation impact are objective bibliographic measures.