Composition and method for polishing a composite comprising titanium
US5770103A · kind A · utility
41Cited by
6References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 8, 1997 |
| Grant date | Jun 23, 1998 |
| Priority date | — |
| Expiry date | Jul 8, 2017 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/3212
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
Aqueous slurries are provided, which are useful for the chemical-mechanical polishing of substrates comprising titanium, comprising: water, submicron abrasive particles, an oxidizing agent, and a mono-, di-, or tri-substituted phenol wherein at least one of the substituted functional groups is polar. Optionally the compositions may also comprise a compound to suppress the rate of removal of silica. The slurries are useful on substrates which also comprise tungsten, aluminum or copper.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.