Exposure apparatus for reproducing a mask pattern onto a photo-sensitive surface of a substrate using holographic techniques
US5774240A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | May 16, 1995 |
| Grant date | Jun 30, 1998 |
| Priority date | — |
| Expiry date | May 16, 2015 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03H2260/12
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure apparatus for reproducing a mask pattern onto a photo-sensitive surface of a substrate uses holographic techniques. The apparatus includes support for holding a hologram recording plate at a predetermined position during both a recording operation and a reconstructing operation. A first illuminating optical system introduces a light beam from a coherent light source to a mask and irradiates a subject beam produced from the mask into the recording plate. A second illuminating optical system irradiates the light beam from a coherent light source as a reference beam into the recording plate, a carrier apparatus disposes during the reconstructing operation, a substrate at the position of the mask, in place of the mask. A third illuminating optical system for irradiates a conjugate beam with the reference beam into the recording plate, in which a hologram has been formed by the recording operation, to form an image of the hologram on the photo-sensitive surface of the substrate. A controler for for selectively controlling the first, second and third illuminating optical systems puts an at least a selected one of the optical system into an operative condition so as to irradia…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.