Chemical vapor deposition apparatus
US5776255A · kind A · utility
20Cited by
7References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 5, 1996 |
| Grant date | Jul 7, 1998 |
| Priority date | — |
| Expiry date | Jul 5, 2016 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S261/65
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A chemical vapor deposition apparatus comprises a starting material container holding a starting material in a liquid state, a starting gas generating container into which the liquid starting material is fed from the starting material container, a means for keeping constant the liquid level of the liquid starting material held in the starting gas generating container, a means for injecting a bubbling gas from the outside into the liquid starting material held in the starting gas generating container, thereby bubbling the starting gas, and a reaction chamber into which a mixed gas of the starting gas and the bubbling gas are fed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.