Patent · US Expired

Process for the stabilization of plasma generation by means of electron beam vaporizer

US5780803A · kind A · utility

3Cited by

6References

8Claims

0Family size

Assignee

Max-Planck-Gesellschaft zur Föderung der Wissenschaften e.V. · US

Inventors

Klaus Goedicke · Dresden, DE
Volker Kirchhoff · Dresden, DE
Christoph Metzner · Dresden, DE
Bert Scheffel · Dresden, DE

Key dates

Filing date	Mar 20, 1997
Grant date	Jul 14, 1998
Priority date	—
Expiry date	Mar 20, 2017

Classification

Technology area (CPC H)Electricity
CPC primaryH01J37/3053
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

The invention relates to a process for stabilizing plasma generation in the coating of large substrate surfaces by means of an electron beam vaporizer. To obtain a stable operation of the apparatus at a high vaporization rate and stable plasma excitation of the vapour cloud without using additional electrodes, according to the invention the vaporization rate of the electron beam vaporizer is initially set so high that at least 10% of the electron beam power is absorbed in the vaporization chamber by the vapour and the optical emission of the resulting plasma is measured. The operating parameters of the electron gun or a process parameter are then controlled in such a way that the optical emission, and therefore the energy absorption, remains constant.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.