Method and apparatus for inspecting patterns composed of reticle data
US5781656A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Mar 17, 1995 |
| Grant date | Jul 14, 1998 |
| Priority date | — |
| Expiry date | Mar 17, 2015 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30148
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method and apparatus for inspecting patterns of reticle data includes carrying out a sizing process in which source data for designing a given device are combined with each other; carrying out a slit filling process in which any slit, that may occur in patterns obtained by the sizing process and is unconformable to a predetermined rule, is deleted by enlarging and reducing patterns; separately storing patterns obtained by the sizing process and patterns obtained by the slit filing process; carrying out a logical operation for patterns obtained by the sizing process and patterns obtained by the slit filling process; storing patterns obtained by logical operation as graphic patterns; detecting patterns each having dimensions equal to or smaller than the predetermined value on the basis of coordinates of the graphic patterns; and deeming the thus detected patterns to be false defect patterns and distinguishing false defect patterns from true defect patterns.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.