Sample evaluation/process observation system and method
US5783830A · kind A · utility
Assignee
Inventors
Key dates
| Filing date | Jun 12, 1997 |
| Grant date | Jul 21, 1998 |
| Priority date | — |
| Expiry date | Jun 12, 2017 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/26
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A sample evaluation/process observation system includes a common sample stage which accommodates a plurality of samples to be processed. The common sample stage is provided with a processing/observing notch and also with a movement mechanism. The movement mechanism functions to sequentially move the plurality of samples to the notch to cause the samples to be exposed to a predetermined processing beam and observing beam. The system further includes a beam processing device in which the common sample stage can be mounted and which functions to irradiate the predetermined processing beam on the plurality of samples through the notch to thereby sequentially perform beam processing operation over the samples. The system further includes a beam observation device in which the common sample stage can be mounted and which functions to irradiate the predetermined observing beam on the plurality of samples through the notch to sequentially observe and evaluate shapes of the plurality of samples. A mark is formed on one sample by a focused ion beam device so that positioning of the mark realizes automatic processing of a part of the sample to be processed. Further, the common sample stage is…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.