Multi-beam pitch adjustment system and method
US5786594A · kind A · utility
76Cited by
2References
74Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 21, 1997 |
| Grant date | Jul 28, 1998 |
| Priority date | — |
| Expiry date | Jan 21, 2017 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH04N1/12
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
The current disclosure discloses methods of and systems for automatically adjusting or selecting a pitch between beams in a multi-beam scanning system. An array of light sources is mounted on a rotatable housing and emits light in a direction perpendicular to the rotational plane. The system or method measures a pitch on or near an intermediate image-forming surface. In response to the measured pitch, the scanning as well as sub-scanning pitch is automatically adjusted or selected by rotating a housing unit to maintain a desired pitch.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.