Method and apparatus for mapping of semiconductor materials
US5797114A · kind A · utility
6Cited by
5References
15Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | Jan 26, 1996 |
| Grant date | Aug 18, 1998 |
| Priority date | — |
| Expiry date | Jan 26, 2016 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L22/14
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method and apparatus for resistivity mapping of semiconductor materials by causing currents to flow in a semiconductor body and measuring resultant potentials created between pairs of surface probes. A resistivity map is produced using the information gathered.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.