Nitrogen trifluoride thermal cleaning apparatus and process
US5797195A · kind A · utility
14Cited by
12References
14Claims
0Family size
Assignees
Inventors
Key dates
| Filing date | Feb 17, 1995 |
| Grant date | Aug 25, 1998 |
| Priority date | — |
| Expiry date | Feb 17, 2015 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/4405
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The present invention is a method and apparatus for the dynamic cleaning of semiconductor fabrication equipment and particularly quartzware with thermally activated nitrogen trifluoride wherein the cleaning effluent is safely removed and cleaning by-products isolated or diluted to provide for efficient cleaning and rapid restarts of fabrication equipment so cleaned.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.