Device for masking or covering substrates
US5800687A · kind A · utility
16Cited by
0References
20Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Apr 14, 1997 |
| Grant date | Sep 1, 1998 |
| Priority date | — |
| Expiry date | Apr 14, 2017 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3408
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A device including a sputtering cathode 2 and masks for masking or covering portions of a surface of a substrates 27, having a center mask guide element 56 on which a center mask 26, which covers the substrate 27, is disposed and works together with an outer mask 4 in such a way that only the uncovered part of the substrate 27 is coated during the coating process. The inner and/or the outer masks 4, 26 can be adjusted independently of each other along a longitudinal center axis 58 of the device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.