Method and apparatus for cryogenically cooling a deposition chamber
US5806319A · kind A · utility
Inventors
Key dates
| Filing date | Mar 13, 1997 |
| Grant date | Sep 15, 1998 |
| Priority date | — |
| Expiry date | Mar 13, 2017 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S417/901
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method and apparatus for depositing parylene monomer within the interior of a deposition chamber of a parylene deposition system. In certain embodiments, the method comprises the steps of: (a) introducing a cryogenic fluid into the interior of the deposition chamber to cool the surface of the substrate; and (b) introducing the parylene monomer into the interior of the chamber to deposit the parylene monomer onto the surface of the substrate. In some embodiments, the apparatus comprises: a deposition chamber; a pumping system, a source of cryogenic fluid, a gas source and at least one support mount disposed within the interior of the deposition chamber. The pumping system reduces the pressure of the interior of the deposition chamber, and the pumping system is in fluid communication with the interior of the deposition chamber. The source of cryogenic fluid is in fluid communication with the interior of the deposition chamber. The gas source is in fluid communication with the interior of the deposition chamber. Optionally, the method or apparatus may include the use of a load lock chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.