Substrate heat treatment table apparatus
US5817156A · kind A · utility
Assignees
Inventors
Key dates
| Filing date | Oct 25, 1995 |
| Grant date | Oct 6, 1998 |
| Priority date | — |
| Expiry date | Oct 25, 2015 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/68778
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A substrate treatment apparatus according to an aspect of the invention includes a table for placing thereon an object to be treated, heating means for heating the object with the table interposed therebetween, and a plurality of support members which project from the table for supporting the object with a space interposed between the object and the table. The height of each of the support members can be varied in accordance with a surface temperature distribution of the object during treatment. A substrate treatment apparatus according to another aspect of the invention includes a table for placing thereon an object to be treated, and heating means for heating the object with the table interposed therebetween. The table has a surface thereof divided into regions of different heat radiation states in accordance with a surface temperature distribution of the object during treatment of the object.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.