Patent · US Expired

Method for the treatment of semiconductor material

US5820688A · kind A · utility

13Cited by

10References

6Claims

0Family size

Assignee

Wacker Chemie AG · DE

Inventors

Franz Koppl · Altötting, DE
Friedrich Steudten · Burghausen, DE
Matthaus Schantz · Simbach, DE

Key dates

Filing date	Apr 25, 1997
Grant date	Oct 13, 1998
Priority date	—
Expiry date	Apr 25, 2017

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY10S134/902
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

A method for the treatment of semiconductor material in a liquid bath has the treatment based upon the occurrence of cavitation being brought about in the liquid bath. The semiconductor material is contacted with a cavitating liquid in order to clean fragments of the semiconductor material and to round fracture edges of the fragments.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.