Method and apparatus for reducing build-up of material on inner surface of tube downstream from a reaction furnace
US5827370A · kind A · utility
Assignee
Inventor
Key dates
| Filing date | Jan 13, 1997 |
| Grant date | Oct 27, 1998 |
| Priority date | — |
| Expiry date | Jan 13, 2017 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C16/4412
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An apparatus for preventing the deposition and build-up of chains of polymerized TEOS molecules in the pipes downstream from a reaction furnace in a semiconductor manufacturing process includes an annular nozzle assembly positioned inside the pipes such that a plenum is formed between the annular nozzle assembly and the pipes and such that the annular nozzle forms a hollow tubular conduit for conducting effluent from the reaction furnace. The annular nozzle assembly preferably includes three hollow and generally cylindrical sections, an upstream collar, a downstream spacer ring, and a middle section(s) positioned between the upstream collar and the downstream spacer ring. The annular nozzle assembly is placed within the pipes downstream of the reaction furnace during operation and is modularly constructed so that the length of the annular nozzle assembly can be varied, depending on the length of the downstream pipes from the reaction furnace. The annular nozzle assembly forms a gas boundary layer or moving virtual wall on its inner surfaces that prevents TEOS gas molecules and water vapor molecules from absorbing or residing on the inner surfaces of the annular nozzle assembly, thu…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.