Charged particle deposition of electrically insulating films
US5827786A · kind A · utility
53Cited by
11References
18Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Apr 28, 1997 |
| Grant date | Oct 27, 1998 |
| Priority date | — |
| Expiry date | Apr 28, 2017 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/006
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
In forming an insulating film upon a selected region of a sample, a gaseous vapor is directed over the selected region for depositing a compound of the gaseous vapor containing elements of the insulating film. A charged particle beam is directed toward the selected region in order to decompose the deposited compound and provide the desired insulating film.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.